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磁控溅射法制备AlN薄膜的研究进展
Recent Advances of AlN Films by Magnetron Sputtering Deposition
【摘要】 综述了各种沉积条件对磁控溅射技术生长氮化铝薄膜的微观结构,电学以及光学性能的影响。采用磁控溅射技术,可以选用在适当的条件下制备具有特定功能与结构优良的氮化铝薄膜。
【Abstract】 Reviewed were the effects of various deposition conditions on microstructural,electrical and optical properties of AlN films grown by magnetron sputtering deposition technology.AlN films with special function and excellent structure can be grown under proper conditions by magnetron sputtering.
- 【文献出处】 山东陶瓷 ,Shandong Ceramics , 编辑部邮箱 ,2006年06期
- 【分类号】O614.31
- 【被引频次】9
- 【下载频次】644