【摘要】 基体偏压是多弧离子镀沉积TiA lN涂层工艺中的一个重要参数,它对涂层的结构以及涂层生长速度有重要影响。通过改变沉积过程中的基体偏压,发现TiA lN涂层表面熔滴的密度和直径随基体负偏压的增加而减小,涂层的显微硬度随着基体负偏压的增加而增加,孔隙率随着基体负偏压的升高而降低。更多还原

【Abstract】 Substrate-bias is critical parameters in the process of multi-arc ion plating TiAlN coatings,which has important effect on the structure of coating and film growth rate.By varying substrate-bias,the melt dropet’s diameter and density on TiAlN coatings surface decrease with the increasing of substrate-bias,the microhardness and amount of porosity of TiAlN film increase with the rising of substrate-bias.更多还原