节点文献
化学气相沉积金刚石薄膜刀具膜/基附着性能研究现状
Research Status on the Adhesion between Substrate and Diamond Film Deposited by CVD
【摘要】 CVD金刚石薄膜涂层刀具被认为是能最早实现CVD金刚石工业化应用的领域之一。目前,限制CVD金刚石薄膜涂层刀具产品大规模产业化应用的主要原因,是金刚石薄膜与硬质合金基底之间粘附性能较差。如何提高膜/基粘附性能,确保CVD金刚石薄膜涂层刀具优异性能的发挥、涂层刀具的使用寿命和加工性能,已成为材料科学工作者迫切需要解决的问题。介绍了影响CVD金刚石薄膜硬质合金刀具膜/基附着性能的主要因素、改善金刚石薄膜与硬质合金基体之间附着力的途径以及表征膜/基附着力的测试方法等方面的研究成果,并对提高低压气相金刚石薄膜硬质合金刀具膜/基附着性能的研究现状进行了分析。
【Abstract】 CVD diamond film coated cemented carbide is thought to be applied in industry,the key factor restricts its industrialization is adhesion between diamond film and cemented carbide.How to improve its adhesion is the imminence science problem for materials staffs.Adhesion characteristic is the key question for the fabrication and application of CVD diamond thin film.The main effect factors and improvement approachs on adhesion between diamond film and cemented carbide,some typical adhesion measurements are introduced.The research status and the development direction of adhesion and adhesion measurements are discussed.
- 【文献出处】 表面技术 ,Surface Technology , 编辑部邮箱 ,2006年05期
- 【分类号】TG174;TG711
- 【被引频次】14
- 【下载频次】536