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退火处理对等离子体显示器中氧化镁薄膜特性的影响

Effects of Annealing Treatments on the Characteristics of MgO Films in Plasma Display Panel(PDP)

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【作者】 喻志农薛唯郑德修孙鉴

【Author】 YU Zhi-nong~1,XUE Wei~1,ZHENG De-xiu~2,SUN Jian~2 (1.Department of Optical Engineering,School of Information Science and Technology,Beijing Institute of Technology,Beijing 100081,China;2.Institute of Electronic Physics and Devices,Xi’an Jiaotong University,Xi’an,Shaanxi 710049,China)

【机构】 北京理工大学信息科学技术学院光电工程系西安交通大学电子物理与器件研究所西安交通大学电子物理与器件研究所 北京100081北京100081陕西西安710049

【摘要】 研究了电子束蒸发法制备的氧化镁薄膜在退火处理过程中特性的变化.研究表明:退火处理改善了薄膜的结晶性,降低了红外光谱中水分子吸收峰的强度,并使得低温或低通氧气量制备的氧化镁薄膜的可见光透射比下降,且这些薄膜在退火处理中极易产生裂纹.薄膜的结晶取向或结晶性是薄膜可见光谱变化和表面裂纹产生的主要原因,薄膜表面光洁度对可见光谱变化影响不大.

【Abstract】 Characteristics of MgO films prepared by e-beam evaporation as a function of the annealing process are studied.The results show that,after the annealing process,the crystallinity of MgO films is improved,and the peak intensity in IR spectrum corresponding to water content is decreased.However,the visible transmission is decreased and cracks are easily produced on the surface for MgO films prepared at low temperature or low oxygen flux.The preferred orientation or the crystallinity plays an important role in controlling the visible spectrum and surface features of the deposited MgO films,and the visible spectrum is almost independent of the surface roughness of the films.

  • 【文献出处】 北京理工大学学报 ,Transactions of Beijing Institute of Technology , 编辑部邮箱 ,2006年01期
  • 【分类号】TN873.94
  • 【被引频次】3
  • 【下载频次】299
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