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升华法生长AlN体单晶初探

Study of Sublimation Crystal Growth of Bulk AlN

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【作者】 赵有文; 董志远; 魏学成; 段满龙; 李晋闽;

【Author】 Zhao Youwen,Dong Zhiyuan,Wei Xuecheng,Duan Manlong,and Li Jinmin(Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China)

【机构】 中国科学院半导体研究所; 中国科学院半导体研究所 北京100083; 北京100083;

【摘要】 研究了高温升华法(PVT)生长AlN体单晶的技术和材料的性质.使用陶瓷BN坩埚,加热温度约在1900℃左右,生长结果为AlN晶须或致密多晶,难以生长出较大的AlN晶粒.用钨坩埚加热生长温度达到2200℃左右时,在AlN陶瓷片和6H-SiC片上生长了直径22mm的AlN晶体,最大的晶粒尺寸长10mm、直径5mm.利用X射线粉末衍射分析了几种不同AlN样品的结构和组成.讨论了PVT法生长AlN晶体所涉及的化学热力学过程和现象.

【Abstract】 Experimental results of bulk AlN crystal growth by physical vapor transport(PVT) and its characterization are presented.A growth temperature of 1900℃ is reached by RF coil heating of the AlN source material contained in a BN crucible.Thin needle crystals and dense polycrystals are obtained in this case.It is difficult to grow large AlN crystals using a BN crucible.A growth temperature of 2200℃ is reached by RF induction heating of the source material contained with a tungsten crucible.AlN crystals in a diameter of 22mm are grown on AlN ceramic plate and 6H-SiC wafer,respectively,of which the largest grain size is 10mm in length and 5mm in diameter.The structure and component of several AlN samples are analyzed using X-ray powder diffraction.The chemical thermodynamic process and growth phenomena related to the AlN PVT growth are discussed.

【关键词】 氮化铝; 晶体; 升华法;
【Key words】 AlN; crystal; sublimation;
  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,2006年07期
  • 【分类号】TN304.05
  • 【被引频次】16
  • 【下载频次】394
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