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基于MBE生长的一种Be掺杂InGaAs基区的新结构InGaP/InGaAs/GaAs DHBT
A Novel InGaP/InGaAs/GaAs DHBT Grown by MBE Using Beryllium as p-Type Dopant
【摘要】 报道了一种以InGaAs为基区的新结构InGaP/InGaAs/GaAs双异质结晶体管,获得了直流性能良好的器件.其共射直流增益β达到100,残余电压Voffset约为0.4V,膝点电压Vknee约为1V,击穿电压BVceo超过10V,器件的基极和集电极电流理想因子分别为nb=1.16,nc=1.11,可应用于低功耗、高功率领域.
【Abstract】 We fabricate a novel InGaP/InGaAs/GaAs double hetero-junction bipolar junction (DHBT) with an InGaAs base for the first time in China. Good DC performance is obtained.The common-emitter DC current gain is 100,the offset voltage approximates 0.4V,the knee voltage is about 1.0V,and the open-base breakdown voltage is over 10V.The ideality factors for the base and collector current are 1.16 and 1.11 respectively.These results indicate that the InGaP/InGaAs/GaAs DHBTs are suitable for applications in low power-dissipation and high power.
【关键词】 MBE;
InGaAs基区;
双异质结双极晶体管;
【Key words】 MBE; InGaAs base; double hetero-junction bipolar junction;
【Key words】 MBE; InGaAs base; double hetero-junction bipolar junction;
【基金】 国家重点基础研究发展规划(批准号:G2000068304,2002CB311902);中国科学院重点创新(批准号:KGCX2SW107)资助项目~~
- 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,2006年06期
- 【分类号】TN322.8
- 【被引频次】2
- 【下载频次】94