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纳米Si镶嵌SiO₂薄膜的发光与非线性光学特性的应用

Photoluminescence and Application of Nonlinear Optical Propertyof nc-Si-SiO₂ Films

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【Author】 Guo Hengqun 1, ,Lin Shangxin1,and Wang Qiming2(1 Huaqiao University,Quanzhou 362021,China)(2 Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China)

【机构】华侨大学；中国科学院半导体研究所泉州362021；泉州362021；北京100083；

【摘要】采用射频磁控溅射技术和热退火处理制备了纳米Si镶嵌Si O2薄膜,在室温下观察到光致发光现象,峰值分别位于360,430和835nm,结合吸收谱、光致发光激发谱和X射线衍射分析讨论了发光机理.利用纳米Si镶嵌Si O2薄膜的非线性光学特性可作为可饱和吸收体,在Nd∶YAG激光器中实现被动调Q运转.更多还原

【Abstract】 nc-Si-SiO₂ films are prepared by RF magnetron sputtering technique and thermal annealing.The photoluminescence （PL） spectra at room temperature have 3 luminescent band peaks at 360,430,and 835nm,respectively.The PL mechanism is discussed in combination with absorption measurement,PL excitation,and X-ray diffraction.Passive Q-switched operation of Nd∶YAG lasers is demonstrated with a nc-Si-SiO₂ film as a saturable absorber.更多还原