节点文献
纳米压印技术的工艺和图形精度研究
Process and Pattern Precision in Nano-imprinting Lithography
【摘要】 纳米压印技术通过压印实现了纳米结构的图形转移,具有分辨率高、效率高、成本低的优点。通过对纳米压印过程中影响图形精度的一些因素进行分析,提出了相应的解决方法。结合研制的NIL-01型压印机进行工艺实验,给出纳米压印工艺实验的结果,并对结果进行了分析。试验表明:考虑到影响压印图形精度的各种因素,采用镀有Cr的SiO2模版和NIL-01型压印机,用热压印技术可以压印出具有100 nm特征尺寸的PMMA图形。
【Abstract】 By pressing,nano-imprinting lithography technology to complete the pattern transfer of nano-structure is characterized by high resolution,high efficiency and low cost.By analyzing some factors influencing the pattern precision in nano-imprinting,corresponding measures have been proposed.Experiment has been carried out using self-made NIL01 nano-imprinting equipment.Experimental results show that,in considering a variety of factors influencing pattern precision,PMMA pattern with feature size of 100nm can be got in hot embossing through SiO2 mask coated with Cr and NIL-01 nano-imprint equipment.
- 【文献出处】 半导体光电 ,Semiconductor Optoelectronics , 编辑部邮箱 ,2006年04期
- 【分类号】TN305.7
- 【被引频次】6
- 【下载频次】526