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磁控溅射B4C薄膜的制备与力学性能

Preparation and Mechanical Properties of Magnetron Sputtered B4C Thin Film

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【作者】 韩增虎田家万李戈扬唐建毅

【Author】 Han Zenghu,Tian Jiawan,Li Geyang(State Key Lab of MMCs,Shanghai Jiaotong University,Shanghai,200030,China)Tang Jianyi (Key Lab.for High Temperature Materials & Tests of Ministry of Education,Shanghai Jiaotong University,Shanghai,200030,China)

【机构】 上海交通大学金属基复合材料国家重点实验室上海交通大学国家教育部高温材料及高温重点实验室 上海200030上海200030上海200030

【摘要】 通过磁控溅射方法在不同基片温度下制备了B4C薄膜 ,利用傅立叶红外光谱、X射线衍射、透射电子显微镜表征了薄膜的微结构 ,并采用纳牛力学探针测量了薄膜的力学性能。结果表明 ,室温下制备的B4C薄膜具有很高的硬度 ( 4 2 5GPa)和杨氏模量 ( 3 0 0GPa) ,薄膜呈现非晶或纳米晶特征。随基片温度的提高 ,薄膜略有晶化 ,硬度与杨氏模量相应增加到5 0 4GPa和 4 2 0GPa。

【Abstract】 B 4C films,grown by multi target magnetron sputtering at different substrate temperatures,were studied with Fourier transform infrared spectroscopy,X ray diffraction,transmission electron microscopy to characterize its microstructures.Mechanical properties were evaluated with a nanoindenter.The results show that B 4C film,grown at room temperature may be amorphous or nano crystalline with a high hardness of 42.5 GPa and a Young′s modulus of 300 GPa.With the increase of substrate temperature,B 4C film tends to slightly recrystallize,and its hardness and Young′s modulus go up to 50.4 GPa and 420 GPa,respectively.

  • 【分类号】TN305
  • 【被引频次】5
  • 【下载频次】130
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