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磁控溅射B4C薄膜的制备与力学性能
Preparation and Mechanical Properties of Magnetron Sputtered B4C Thin Film
【摘要】 通过磁控溅射方法在不同基片温度下制备了B4C薄膜 ,利用傅立叶红外光谱、X射线衍射、透射电子显微镜表征了薄膜的微结构 ,并采用纳牛力学探针测量了薄膜的力学性能。结果表明 ,室温下制备的B4C薄膜具有很高的硬度 ( 4 2 5GPa)和杨氏模量 ( 3 0 0GPa) ,薄膜呈现非晶或纳米晶特征。随基片温度的提高 ,薄膜略有晶化 ,硬度与杨氏模量相应增加到5 0 4GPa和 4 2 0GPa。
【Abstract】 B 4C films,grown by multi target magnetron sputtering at different substrate temperatures,were studied with Fourier transform infrared spectroscopy,X ray diffraction,transmission electron microscopy to characterize its microstructures.Mechanical properties were evaluated with a nanoindenter.The results show that B 4C film,grown at room temperature may be amorphous or nano crystalline with a high hardness of 42.5 GPa and a Young′s modulus of 300 GPa.With the increase of substrate temperature,B 4C film tends to slightly recrystallize,and its hardness and Young′s modulus go up to 50.4 GPa and 420 GPa,respectively.
【Key words】 B 4C thin film; Microstructure; Mechanical properties; Magnetron sputtering;
- 【文献出处】 真空科学与技术 , 编辑部邮箱 ,2002年01期
- 【分类号】TN305
- 【被引频次】5
- 【下载频次】130