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Au/BIT/PZT/BIT/p-Si(100)存储器
The Au/BIT/PZT/BIT/p-Si(100) Memory
【摘要】 利用准分子激光原位淀积方法制备了BIT/PZT/BIT,PZT/BIT和BIT层状铁电薄膜,获得了电流密度-电压(I-V)回线和极化强度P-V电滞回线。在这三种结构中,Au/BIT/PZT/BIT/p-Si(100)结构的界面电位降、内建电压及频率效应是最小的。在电压转变电VT、饱和极化强度PS及矫顽场VC之间有三种关系,他们与I-V回线及P-V回线的关系相匹配,这种匹配关系使得以I-V回线操作的存储器将能够非挥发和非破坏读出及具有保持力。
【Abstract】 Multiplayer ferroelectric thin films BIT/PZT/BIT,PZT/BIT and BIT were deposited on (100) ptype silicon wafers by pulsed excimer laser.IV loop and PV loop were obtained.Among three structures,the voltage drop and built in voltage anad frequency effect at the interface of Au/BIT/PZT/BIT/pSi(100) is the smallest.There are three relations between VT,Ps and Vc,which are the conditions of the match relation between IV loop and PV loop,which maintains that this memory operated IV loop will enable nonvolatile memory,nondestructive readout and retention.
【Key words】 Au/BIT/PZT/BIT/Si; memory; thin films; voltage drop; builtin voltage;
- 【文献出处】 压电与声光 ,Piezoelectrics & Acoustooptics , 编辑部邮箱 ,2002年06期
- 【分类号】TP333
- 【下载频次】44