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射频溅射FeTaN纳米晶软磁薄膜结构和磁性
Microstrucrure and magnetic properties of RF-sputtered nanocrystalline FeTaN soft magnetic thin films
【摘要】 用射频反应溅射制备了FeTaN纳米晶软磁薄膜 .研究了薄膜结构和磁性与制备条件的依赖关系 .研究发现 ,当Ta的含量较高时 ,在N2 +Ar混合气氛中易形成沉积态薄膜的非晶结构 .适当的热处理后 ,α Fe纳米晶从中晶化生成 .薄膜显示出优良的软磁特性
【Abstract】 The nanocrystalline FeTaN soft magnetic thin films were prepared by RF\|reactive sputtering, and their microstructure and magnetic properties were investigated. It is found that the as\|deposited films would be amorphous if the concentration of Ta is high in the films. After proper annealing, the nanocrystalline of α Fe crystallizes from the amorphous matrix, and the films exhibit excellent soft magnetic properties.
- 【文献出处】 物理学报 ,Acta Physica Sinica , 编辑部邮箱 ,2002年04期
- 【分类号】O484
- 【被引频次】4
- 【下载频次】85