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直流磁控溅射一步法原位制备MgB2超导薄膜
Single-step in-situ preparation of magnesium diboride superconducting thin films by dc magnetron sputtering
【摘要】 用MgB2 靶 ,控制直流磁控溅射工作在异常辉光放电或弧光放电状态 ,在SrTiO3 衬底上原位一次性得到了MgB2 超导薄膜 ,其起始转变温度为 32K ,零电阻温度为 15K .
【Abstract】 In a single-step in-situ procedure,the superconducting MgB 2 (101) highly oriented thin films have been successfully grown on the SrTiO 3 (100) substrates by using the synthesised MgB 2 target and controlling the magetron sputtering working at the state of abnormal glow discharge or arc discharge.The fillms have a zero resistance transition temperature of 15K and an onset transition temperature of 33K.
【关键词】 高温超导体;
超导薄膜;
磁控溅射;
二硼化镁;
【Key words】 high-temperature superconductor; superconducting thin films; magnetron sputtering; MgB 2;
【Key words】 high-temperature superconductor; superconducting thin films; magnetron sputtering; MgB 2;
【基金】 国家高技术研究发展计划 (批准号 :86 3 CD0 5 0 10 1);国家重点基础研究 ( 973)专项经费 (批准号 :G19990 6 46 0 9;G19990 6 46 0 7)资助的课题~~
- 【文献出处】 物理学报 ,Acta Physica Sinica , 编辑部邮箱 ,2002年02期
- 【分类号】O484.1
- 【被引频次】11
- 【下载频次】192