【摘要】 用一种简便的制备CdTe薄膜的方法———真空气相沉积法 ,在玻璃衬底上沉积CdTe薄膜。在真空度为133μPa真空室中 ,同时蒸发Cd +Te材料 ,形成CdTe薄膜。为改善其性能 ,采用改变Cd∶Te的原子配比和在Cd +Te材料中掺杂In ,用N2 作保护气体 ,要不同温度下对薄膜进行热处理。通过SEM ,XRD ,SAM和AES等测试分析 ,分别研究了热处理前后CdTe薄膜的结构、组分及工艺条件对薄膜性能的影响更多还原

【Abstract】 In this paper, the preparation of CdTe thin films is reported. Prepared by the preparation process is done by evaporating Cd and Te mixtures on glass substrate in the vacuum chamber under the pressure of 133μPa during deposition. It is a simple and convenient procedure based on the method of vacuum vapor phase deposition. In the process of preparation of the CdTe thin film, the stoichiometry of Cd and Te are changed and In atoms are doped in the Cd and Te mixtures to prepare a series of samples. The CdTe thin films are heat treated at different temperatures in nitrogen. The composition, the crystallographic properties of the thin films are investigated before and after heat treatment by measurement and analysis of SEM, XRD, SAM and AES et.更多还原