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镍钝化多孔硅表面形貌的控制和光致发光性能的改善

Morphology Control and Photoluminescence Improvement of Nickelpassivated Porous Silicon

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【作者】 富笑男李新建

【Author】 FU Xiaonan~(1,2) LI Xinjian~1 (Department of Physics and Laboratory of Materials Physics,Zhengzhou University~1,Zhengzhou 450052,Department of Fundamental Section,Zhengzhou Engineering Institute~2,Zhengzhou 450052)

【机构】 郑州大学物理系和材料物理实验室郑州大学物理系和材料物理实验室 郑州450052郑州工程学院数理部郑州450052

【摘要】 利用水热技术制备了系列镍钝化多孔硅样品,并对其表面形貌和光致发光谱进行了研究。实验表明,样品的表面形貌与其光致发光特性之间存在强烈的关联:采用具有较低Ni2+浓度的腐蚀液所制备的样品表面形貌更为均匀,并具有相对较强的发光和较窄的发光峰。初步探索了通过对样品表面形貌的控制来改善样品发光性能的有效途径。

【Abstract】 Series of nickel-passivated porous silicon were fabricated by hydrothermally etching single crystal silicon wafers under different etching conditions. Morphology and photoluminescence (PL) investigation are disclosed that there exist strong correlation between the characteristics of the surface morphology and PL, i.e., the samples prepared with lower Ni2+ concentration are exhibited more regular surface morphology, stronger PL, as well as narrower PL band. The possibility of the realization of the PL improvement through controlling the surface morphology of porous silicon is also explored.

【基金】 国家自然科学基金(19904011)资助;河南省杰出青年科学基金(0014)资助
  • 【文献出处】 科学技术与工程 ,Science Technology and Engineering , 编辑部邮箱 ,2002年05期
  • 【分类号】O482.31
  • 【被引频次】2
  • 【下载频次】66
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