【摘要】 将无磨料抛光与低温抛光结合起来,首次提出一种可获得原子级超光滑表面的新方法——无磨料低温抛光。这种新工艺可使光学材料获得Ra<1nm的原子级超光滑表面,通过大量的试验,系统研究了抛光盘水质、抛光前修盘时间、抛光压力和偏心等对已加工表面粗糙度的影响规律。结果表明,这种抛光工艺能获得原子级的超光滑表面。更多还原

【Abstract】 A process of cryogenic polishing without abrasive is proposed ,which combines abrasiveless polishing and cryogenic polishing. This new process gains super-smooth surface on optical material with angstrom dimension (Ra<1nm). By various experiments , the effects of water quality of polishing disk , time of modifying ice disk, polishing pressure and eccentricity on surface roughness are studied. Results show that this process can reach surface roughness with angstrom dimension.更多还原