【摘要】 本文利用对向靶反应溅射法制备Fe N膜 ,本底真空度为 6× 10 -4 Pa,溅射功率为 16 0W ,基底温度约为180℃ ,再经 180℃退火处理。所得样品的结构由X射线衍射分析 (XRD)得到 ,并对Fe N膜时效性进行了跟踪实验。结果表明 ,制备的Fe N膜在室温条件下放置半年以上 ,其膜的结构及各相含量基本未变。更多还原

【Abstract】 Fe-N films were prepared by facing target active sputtering (FTS) method.The base pressure(～6×10 -4Pa),substrate and annealing temperature(～180℃)were adopted.The films’ structure and ageing effect are investigated by X-ray diffraction.The results indicate that the structure and phase volume fractions in the films remained basically unchanged.更多还原