【摘要】 采用常压CVD方法在铝合金基底上制备出硅氧化合物陶瓷膜层。使用SEM、TEM及XPS仪分析了膜层形貌、成分和组织结构 ,通过 180°、90°弯曲实验和 45 0℃热冲击实验考察了陶瓷膜层与基片的结合性能 ,证实该技术制备的膜层与基底的结合强度很高。更多还原

【Abstract】 The silicon oxide films on aluminum alloys matrix were prepared by chemical vapor deposition (CVD) in ambient pressure. The morphology, composition and microstructural characteristic of the film were tested by SEM,XPS and TEM technologies respectively, The adhesive property of the film was measured with the 180° and 90° bending test and the 450℃ thermal shock test. The results prove that the film possesses a high bonding strength with the substrate.更多还原