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低能氮离子注入西瓜胚芽的存活率的初步研究
Study on Survival Rate of Watermelon Shoots Implanted with Low Energy Ion Beams
【摘要】 以西瓜胚芽为材料 ,研究了低能氮离子注入植物活体组织的存活率和二甲亚砜 (DMSO)预处理对存活率的影响。结果表明 ,真空冰冻对存活率有一定影响 ,离子注入损伤是植物活组织在离子注入时存活率降低的主要原因 ;在能量为 2 5 ke V,总剂量为 3.9× 10 1 6ions/ cm2 ,脉冲剂量为 1.3× 10 1 4 ions/ cm2 的注入参数下 ,1%的 DMSO预处理 2 5~ 35分钟可以降低失水率并大大提高胚芽的存活率。由此讨论了进一步扩大低能离子注入的应用范围 ,以及在果树、花卉和无性繁殖的作物上进行诱变育种或遗传转化的可能性。
【Abstract】 While implanted with low energy ion beam (LEIB),plant living tissue-shoots of watermelon were well protected by pretreatment with dimethysulfoxide(DMSO).The results showed that,although affected by vacuum,low survival rate of living shoots after ion implantation was mainly caused by damage from implantation.After implantation at energy of 25 keV,total dosage of 3.9×10 16 ions/cm 2,pulse dosage of 1.3×10 14 ions/cm 2,25~35 minutes pretreatment with 1% DMSO may decrease the loss rate of water and increase the survival rate.The results may be applied to enlarge the application scope of LEIB implantation,and make it possible to breed flowers,fruit tree and asexual crops or transfer foreign gene into these plants with this new method.
【Key words】 low energy ion beams; ion implantation; watermelon (Citrullus vulgaris schrad); shoot; dimethysulfoxide(DMSO);
- 【文献出处】 激光生物学报 ,Acta Laser Biology Sinica , 编辑部邮箱 ,2002年03期
- 【分类号】Q691.5
- 【被引频次】11
- 【下载频次】84