【摘要】 采用溶胶 凝胶法在Si( 0 0 1 )基片上制备铁电铌酸锶钡薄膜 ,使用X射线衍射、摇摆曲线、扫描电子显微镜、喇曼散射光谱等测试手段研究薄膜的微结构与薄膜厚度之间的关系 ,制备的薄膜厚度可达到 5 μm 实验发现 ,随着薄膜厚度的增加 ,SBN60和SBN75薄膜在 ( 0 0 1 )方向的优先取向性越来越好 随着膜层的增加 ,处于底层的膜层能够起到缓冲层的作用 ,以逐渐改善薄膜与基片之间的晶格失配 ,从而使得晶体的结晶取向性越来越好更多还原

【Abstract】 Strontium barium niobate (SBN) thin film spin coated onto Si (001) substrates have been prepared by sol gel route,the microstructure of the SBN films were studied with the methods of X ray diffraction,rocking curve,scanning electron micrscope as well as Raman scattering spectrun.Structural change in SBN films was studied as a function of film thickness up to 5μm.SBN60 and SBN75 tetragonal phase with enhanced (001) orientation were observed in thicker films.The results show that the few bottom layers act as the buffer layers which modify the lattice mismatch between the substrate and the SBN thin films,in this way the crystallinity of a multi coated films could become better.更多还原