节点文献
碳氮膜的红外光谱特性分析
THE CHARACTER ANALYSIS OF C-N FILM INFRAED ABSORPTION SPECTRUM
【摘要】 用射频直流磁控溅射法在硅、石英基片上制备碳氮膜 ;采用傅里叶变换红外光谱(FTIR)技术 ,对基片上的碳氮膜进行红外光吸收谱测量 ,发现所制备的膜中有 β相的C3N4;用硬度计测量镀膜后的硬度 ,均比镀膜前有所增强 ;对所制备的膜进行热处理 ,结果发现热处理前膜的红外吸收谱与热处理后的红外吸收谱相比没有变化 ,说明膜的热稳定性较好 ,可以作为红外光学材料
【Abstract】 Carbon Nitride films have been deposited on Si and quartz substrata by RF direct current-magnetron sputtering. With Fourier transform infrared spectroscopy (FTIR), the infrared spectra of the film, which has been prepared on Si underlay, can be draw .The result show that there are β-C 3N 4 in the films .The hardness of the films has been measured and showed that the hardness has been improved. The infrared absorption spectra are steady in the case of normal and heated situations. It can be used as infrared optical material.
【关键词】 碳氮膜;
磁控溅射;
红外光吸收谱;
【Key words】 Carbon nitride film; Magnetron sputtering; Infrared absorption spectrum;
【Key words】 Carbon nitride film; Magnetron sputtering; Infrared absorption spectrum;
- 【文献出处】 光子学报 ,Acta Photonica Sinica , 编辑部邮箱 ,2002年09期
- 【分类号】O484.41
- 【被引频次】2
- 【下载频次】119