【摘要】 采用射频等离子增强化学气相沉积法制备出a-C∶H(N)类金刚石薄膜 ,用X射线光电子能谱、红外吸收谱和慢正电子湮灭谱研究了薄膜的结构 ,用弯曲法测定了薄膜的内应力 .随着混合气体中N2 的含量从 0增加到 75 % ,薄膜中含N量可增加到 9.0 9% (摩尔分数 ) ,N原子与C原子以%DC—N ,C N和C≡N键的形式结合 .薄膜中的缺陷密度随含N量而增加 ,而薄膜的内应力则随着薄膜中N含量的增加而单调降低更多还原

【Abstract】 a-C∶H(N) diamond_like carbon films were deposited from the mixture of C 2H 2, Ar and N 2 in a radio frequency plasma reactor. The films were characterized by X_ray photoelectron, infrared adsorption and positron annihilation spectroscopy. The internal stress was determined by substrate bending methods. With the increase of N 2 in the feed gas from 0 to 75%, the N content in the films increased to 9.09%(in mole) and the internal stress decreased from 1.6 GPa to 0.15 GPa. N atoms in the films were found incorporated with C atoms as C-N, CN and C≡N bonds. Positron annihilation spectrum showed that the density of voids increased with increasing N content in the films.更多还原