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光电子材料InP玷污的研究
Study on Pollution for the Photoelectronic Material InP
【摘要】 文章给出了光电子材料InP的 ( 10 0 )和 ( 111)晶面质谱分析的结果 ,对 ( 10 0 )晶面做了光荧光分析。在 30 0和 77K温度下测量了 ( 10 0 )晶面的电子浓度及电子迁移率。研究表明玷污主要来自硅
【Abstract】 The mass spectrum analysis of crystal face (100) and (111) and the photoluminescence analysis of crystal face (100) in the photoelectronic material InP were given.The Hall coefficient,charge carrier concentration and Hall mobility were determined.Experimental results indicate that the pollution of silicon is predominant.
【关键词】 质谱分析;
光荧光;
电子浓度;
电子迁移率;
【Key words】 Mass spectrum analysis; Photoluminescence; Electron concentration; Electron mobility;
【Key words】 Mass spectrum analysis; Photoluminescence; Electron concentration; Electron mobility;
- 【文献出处】 光谱学与光谱分析 ,Spectroscopy and Spectral Analysis , 编辑部邮箱 ,2002年04期
- 【分类号】O474
- 【下载频次】39