【摘要】 利用电弧离子镀技术在高速钢基体上制备了TiN和(TiTa)N薄膜.采用X射线衍射(XRD)、透射电子显微镜(TEM)对薄膜的微观组织结构进行了系统分析.研究结果显示:随着阴极弧电流的增加,沉积温度线性上升,薄膜由(111)织构向无择优取向转化;阴极弧电流对TiN薄膜的显微硬度影响较大,而对(TiTa)N薄膜的显微硬度无显著影响.此外,讨论了阴极弧电流对TiN和(TiTa)N薄膜的微观组织和性能的影响机制.更多还原

【Abstract】 TiN and (TiTa)N coatings were synthesized on high\|speed\|steel substrates by using arc ion plating. X\|ray diffraction and transmission electron microscopy were used to characterize the microstructures of TiN and (TiTa)N coatings synthesized with various cathode arc currents. It is found that the substrate temperature increases linearly with the increase of cathode arc current and the microstructures of both TiN and (TiTa)N coatings change from (111) texture to no favorite orientation. Meanwhile, the microhardness of TiN coating increases considerably. The change of cathode arc current, however, has no obvious influence on the microhardness of (TiTa)N coatings. The possible mechanism of the cathode arc current′s influences on the microstructures and properties of TiN and (TiTa)N coatings has also been discussed in this paper.更多还原