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氩单原子嵌入晶体过程的分子动力学模拟
Molecular dynamics analysis of argon atom indentation on crystal substrate
【摘要】 采用分子动力学模拟技术研究氩单原子嵌入基体时发生的变形过程,揭示了基体温度、嵌入速度对界面法向力、材料变形行为的影响.模拟结果表明L-J固体中位错运动的方向与宏观塑性流动相一致,压缩屈服强度随着基体温度的增加和嵌入速度的减小而降低.
【Abstract】 The Argon single atom indentation processes is analyzed using molecular dynamics simulation technique. The effects of substrate temperature and indentation speed on the interfacial normal force, material deformation behavior is revealed. The direction of the dislocation movement is shown to coincide with that of macroscopic plastic flow. The compressive yield strength decreases with increasing substrate temperature and decreasing indentation speed.
【基金】 国家自然科学基金项目的资助,(50071014).
- 【文献出处】 大连海事大学学报 ,Journal of Dalian Maritime University , 编辑部邮箱 ,2002年04期
- 【分类号】O313.5
- 【下载频次】87