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α-Fe2O3纳米晶薄膜厚度对光电流的影响

The Effect of the Thickness of α-Fe2O3 Nanocrystalline Thin Film on the Photocurrent Response

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【作者】 吕红辉文子钱新明汤心颐白玉白

【Author】 LU·· Hong Hui, WEN Zi (Department of Applied Chemistry (Nanling Campus),Jilin University,Changchun) QIAN Xin Ming, TANG Xin Yi, BAI Yu Bai * (Department of Chemistry(Qianwei Campus),Jilin University,Changchun 130023)

【机构】 吉林大学应用化学系吉林大学化学系吉林大学化学系 (南岭校区)长春(南岭校区)长春前卫校区长春130023前卫校区长春130023

【摘要】 研究了不同α-Fe2 O3纳米晶薄膜厚度及不同光照方向时α-Fe2 O3/ ITO电极在 KCl溶液中的光电化学行为 ,发现当膜的厚度增加时 ,光电流响应减弱 .当膜的厚度较薄 (5 0μm)时 ,正、反两面光照对光电流的响应几乎不会产生影响 ,而当膜较厚 (1 0 0μm)时 ,反面光照的光电流响应更强 .

【Abstract】 The photoelectrochemistry of α Fe 2O 3 nanocrystalline thin films with different thickness in KCl solution was studied. It is found that the photocurrent response was decreased with the film thinkness. The decrease of photocurrent responses of thicker films is explained in terms of the electric resistance effect and recombination effect. For thinner α Fe 2O 3 film (50 μm) no difference was found for the photocurrent response under frontwall (FW) and backwall (BW) illuminations, while for thicker α Fe 2O 3 film (100 μm) the photocurrent response was larger under BW illumination than that under FW illumination.

【基金】 国家自然科学基金 ( 2 97730 17) ;中国博士后科学基金;中国科学院王宽诚博士后工作奖励基金资助项目
  • 【文献出处】 应用化学 ,Chinese Journal of Applied Chemistry , 编辑部邮箱 ,2001年10期
  • 【分类号】O614
  • 【被引频次】4
  • 【下载频次】115
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