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6H-SiC反型层电子库仑散射
Study of coulomb scattering in 6H SiC inversion layers
【摘要】 提出了一种综合的SiC反型层库仑散射解析模型 ,并在模型中考虑了库仑电荷中心的相关性 .对6H SiC反型层电子迁移率进行了单电子MonteCarlo模拟 ,模拟结果和实验值相符 .模拟结果表明 ,当有效横向电场变小时库仑散射的作用将增强 ,库仑电荷密度和分布也对反型层迁移率有着重要影响
【Abstract】 A comprehensive analytical model for coulomb scattering in 6H SiC inversion layers is presented considering all the coulomb effects of the charged centers near the SiC/SiO 2 interface. This model takes into account the effects of the charged centers correlation. The electron mobility in 6H SiC inversion layers has been studied by the single particle Monte Carlo technique. The simulation results agree with the experimental data very well. The study shows that coulomb scattering becomes more important at low transverse electric field and both the density and the distribution of charged cneters play an important role in electron transport in SiC inversion layers.
【Key words】 H SiC; inversion layer mobility; coulomb scattering; Monte Carlo study;
- 【文献出处】 西安电子科技大学学报 ,Jounal of Xidian University , 编辑部邮箱 ,2001年02期
- 【分类号】TN304
- 【被引频次】4
- 【下载频次】58