【摘要】 采用火焰水解法 ( FHD)在 Si片上快速淀积出 Si O2 厚膜材料 ,材料膜厚 40 μm以上 ,生长速率 8μm/ min.将该材料分别在真空中和空气中高温致密化处理 ,获得各种形态的二氧化硅厚膜材料 .利用 XRD,SEM,电子显微镜等仪器对 Si O2 膜的表面和膜厚进行测试分析更多还原

【Abstract】 The SiO 2 thick films were deposited on silicon substrate by flame hydrolysis deposition (FHD). The thickness of the films was up to 40 μm, and the deposition speed was as high as 8 μm per minute. Then, the films were consolidated in electric furnaces both in vacuum and air ambience. Finally, the silica films were analyzed by means of XRD, SEM, microscopy, etc.更多还原