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CD-R光盘盘基槽深和槽宽均匀性测试方法研究

Measurement for Uniformity of Groove Depth and Width of CD-R Optical Disc Substrates

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【作者】 徐文东干福熹施宏仁何红林强

【Author】 XU Wen dong GAN Fu xi SHI Hong ren HE Hong LIN Qiang (Shanghai Institute of Optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai 201800)

【机构】 中国科学院上海光机所中国科学院上海光机所 上海201800上海201800上海201800

【摘要】 介绍了一种利用衍射方法测试CD R光盘盘基槽深和槽宽均匀性的方法。CD R光盘盘基槽深和槽宽均匀性的测试对于CD R光盘的制造非常重要 ,它可反映出母盘涂胶、刻录、显影、金属化、电铸及盘基复制的质量。尽管它不能精确测试沟槽的形状 ,但在测试均匀性时却显得简单、可靠、灵敏、快速和无损。同时给出同一盘基用衍射方法和原子力显微镜方法的测试结果

【Abstract】 In this paper, a testing system for groove geometry of CD R substrates by measuring diffraction orders is introduced. This testing is of particular importance in CD R disc manufacture process because the results fed back from the testing can be used to help optimize recording, developing, metalizing, electroplating and replicating processes. Even if the width and depth of groove are not accurately obtained by this system, it is also valuable in CD R disc manufacturing process because the system, which can be used to judge the quality of substrates, is simple, sensitive, quick and non destructive. The results of a same sample tested by our system and an AFM microscope are presented simultaneously.

【基金】 国家重点科技项目 (攻关 )计划子专题 (编号 :85 710 0 3 0 1 4)资助项目
  • 【文献出处】 中国激光 ,Chinese Journal of Lasers , 编辑部邮箱 ,2001年11期
  • 【分类号】TP333.43
  • 【被引频次】4
  • 【下载频次】109
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