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低熔瓷熔附于纯钛的结合界面研究
A Study on the Bond Interface Between Low fusing Dental Porcelain and Pure Titanium
【摘要】 目的 研究纯钛的表面烤瓷与钛 -瓷界面的关系及低熔瓷熔附于纯钛界面的形态学特征和锡、硅元素扩散情况。方法 在纯钛表面上烧烤 L a- porcelain低熔遮色瓷及 Vita Titankeramik遮色瓷 ,采用扫描电子显微镜观察及电子探针检测 ,观察纯钛和瓷界面区域材料组织结构 ,分析界面性质和元素扩散情况。结果 L a- porcelain低熔遮色瓷在纯钛表面有良好的浸润性和扩散作用 ,对纯钛附着紧密。 L a- porcelain 低熔遮色瓷与 VitaTitankeramik遮色瓷相比 ,瓷与基体间具有组织致密 ,结合强度较高等优点。电子探针分析发现界面区有锡、硅元素扩散现象。结论 L a- porcelain低熔遮色瓷能改善钛 -瓷界面的结合状况 ,在瓷烧烤温度下钛 -瓷界面存在锡元素的扩散 ,锡元素在钛 -瓷结合中起着重要作用。
【Abstract】 Objective To evaluate the bond interface between low fusing dental porcelain and pure titanium by observing the topography and detecting the ionic diffusion in the interface area. Methods The low fusing porcelain La porcelain produced by the authors or Vita Titankeramik porcelain was fused to the surfaces of pure titanium. The topography of the interface between pure titanium and porcelain, and the structure of experimental materials were observed with SEM . The state of ionic diffusion in the interface area was investigated with EPMA. Results Excellent permeation and diffusion of La porcelain were observed on the surfaces of pure titanium. The diffusion of ions of stannum and silicon was discovered in the interface area. The microstructure of La porcelain to pure titanium bond interface was finer than that of Vita Titankeramik porcelain. Conclusion Excellent bond can be produced in the interface between La porcelain and pure titanium. The bonding mechanism may involve mechanical bond and chemical bond. The ionic diffusion of stannum plays an important role in the bonding of porcelain to pure titanium.
- 【文献出处】 华西医科大学学报 ,Journal of West China University of Medical Sciences , 编辑部邮箱 ,2001年03期
- 【分类号】R783.1
- 【被引频次】12
- 【下载频次】95