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射频等离子沉积聚硅氧烷薄膜的XPS研究

Study of Thin Poly-hexamethyladisiloxane Films Deposited with R.f.Plasma with XPS

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【作者】 齐尚奎吕晋军张平余杨生荣王云飞王敬宜

【Author】 Qi Shangkui *, Lü Jinjun, Zhang Pingyu, Yang Shengrong ( State Key Laboratory of Solid Lubrication of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000) Wang Yunfei, Wang Jingyi ( Lanzhou Physics Institute of China, Lanzhou

【机构】 中国科学院兰州化学物理研究所固体润滑国家重点实验室!兰州730000兰州物?

【摘要】 用CVD方法在一台射频放电等离子体聚合实验装置内成功地制备了沉积聚酯薄膜基底有机聚硅氧烷薄膜。该薄膜在有原子氧模拟实验装置内具有抗原子氧剥蚀的良好性能 ,对航天器等材料表面起到防护作用。有机聚硅氧烷薄膜与等离子体沉积时氧的泄露量有关 ,且沉积密度经AFM检测有较大的差异。并用XPS较详细考察了不同工艺制备的聚硅氧烷官能团构成和表面状态 ,以期得到优良的防剥蚀膜

【Abstract】 Thin poly-hexamethyladisiloxane films on deposited polyster film substrate were successfully prepared with CVD method in a R.F. plasma polymerizing apparatus. Elemental oxygen erosion resistance of the films was measured in an equipment simulated the elemental oxygen environments and the property was good. The films can protect the material surface of the apparatus in space. Property of the films related to the loss of oxygen in the film preparation and deposited density of the films that was tested by AFM was not uniform. Functional groups structure and surface chemical state of the films, which were prepared under different processing parameters were investigated by using XPS in present work in order to obtain films that had good elemental oxygen erosion resistance.

【关键词】 原子氧CVD有机聚硅氧烷XPS
【Key words】 Elemental oxygenCVDPoly-hexamethyladisiloxane filmXPS
  • 【文献出处】 化学物理学报 ,Chinese Journal of Chemical Physics , 编辑部邮箱 ,2001年04期
  • 【分类号】O634
  • 【被引频次】8
  • 【下载频次】112
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