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弧矢聚焦双晶单色器聚焦误差分析
Analysis of the focusing error of sagittally focusing double-crystal monochromator
【摘要】 简单介绍了弧矢聚焦单色仪的分光原理及结构原理 ,分析了同步辐射弧矢聚焦双晶单色器实际转轴偏离理想转轴ΔS及晶面偏离与导轨的理想夹角Δα对出射光高度的影响 ,并对弧矢聚焦晶体压弯半径的压弯精度Δh对实验站聚焦光斑展宽的作用进行了理论推导。当ΔS≤ 31μm、Δα ≤ 1′,就可以确保出射光线高度误差Δh≤ 2 5 μm ;当对称压弯第二晶体所需微位移器的行程≥ 1mm、精度≤ 1.2 5 μm时 ,可满足聚焦光斑的展宽≤ 0 .5mm要求 ,且当压弯半径R的弯曲精度在ΔR≤ 0 .75 %R的范围内不需对晶体压弯。
【Abstract】 The paper briefly introduces the monochromatic and structure principles, and also analyses the height error of the reflective beam of the monochromator in synchrotron radiation, which is decided by what the rotational axis and the angle between the diffracting surface of crystal and the slide depart from the theoretical position, and gets the relation between the width of the facula focused and the driving precision of the bender, offering the theoretical base for the installment and movement of the two crystals.When ΔS≤31μm、Δα≤1′, height error of the reflected beam is Δh≤25μm, when the travel of micropositioner is more than 1mm, the precision is less than 1.25μm and the width of the facula focused is less than 0.5mm, and when ΔR≤0.75%R(R is the curved radius of crystal), the crystal may not be beat.
- 【文献出处】 光学精密工程 ,Optics and Precision Engineering , 编辑部邮箱 ,2001年03期
- 【分类号】TL54
- 【被引频次】4
- 【下载频次】54