节点文献
氧化钒薄膜的结构、性能及制备技术的相关性
Relativity among structures, properties and preparation of vanadium oxides thin films
【摘要】 氧化钒薄膜及其在微电子和光电子领域中的应用已成为国际上新颖功能材料研究的热点之一。本文综述了V2 O5和VO2 薄膜电学性能与薄膜组分和结构的相关性 ,比较了不同工艺制备的氧化钒薄膜的电学性能差异
【Abstract】 There has been a lot of interest in vanadium oxides thin films because of their extensive applications in microelectronics and optoelectronics. Relativity between structures and electrical properties was summarized, meanwhile differences among properties of VO 2 and V 2O 5 films prepared on a variety of substrates by different methods are analyzed.
【关键词】 氧化钒薄膜;
相变;
热电阻温度系数;
【Key words】 thin films of vanadium oxides; metal semiconductor phase transition; thermal coefficient of resistance;
【Key words】 thin films of vanadium oxides; metal semiconductor phase transition; thermal coefficient of resistance;
【基金】 中国科学院上海冶金研究所离子束开放实验室资助
- 【文献出处】 功能材料 ,Journal of Functional Materials , 编辑部邮箱 ,2001年06期
- 【分类号】TB43
- 【被引频次】78
- 【下载频次】462