【摘要】 利用微波电子回旋共振等离子体化学气相沉积技术 ,通过改变微波输入功率的方法 ,沉积了具有不同结构特征的氟化非晶碳 (α C∶F)薄膜。随着微波功率从 14 0W升高到 5 6 0W ,薄膜的光频介电常数从 2 .2 6降至 1.6 8,红外光谱 (FTIR)分析表明薄膜的键结构由以CF基团为主变化到CF与CF2 基团共存。由于CF2 基团的极化比CF基团弱 ,薄膜中CF2 基团的增加可能是导致光频介电常数减小的因素更多还原

【Abstract】 Amorphous fluorinated carbon (α C∶F) films with different structural feature are prepared by microwave electron cyclotron resonance (ECR) plasma chemical vapor deposition (CVD) at different microwave input powers. A change of film bonding configurations from CF group mainly to coexisting of CF and CF 2 groups is found by FTIR and XPS analysis as microwave input power is increased from 140W to 560W. Meanwhile, the dielectric constant due to electron polarization contribution is decreased from 2.26 to 1.68. Because the polarization of CF 2 group is weaker than that of CF group, the decreasing of dielectric constant is due to weaker polarization of CF 2 group in the films.更多还原