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ECR-CVD沉积a-C∶F薄膜
Fluorinated amorphous carbon thin films grown by ECR-CVD
【摘要】 采用电子回旋共振等离子体化学气相沉积 (ECR CVD)技术 ,用苯和三氟甲烷混合气体 ,制备了氟化非晶碳膜 (a C∶F)。用红外吸收光谱 (FTIR)和X射线光电子能谱 (XPS)分析了a C∶F薄膜的结构。FTIR结果表明 ,氟主要以C—F、CF2 的形式成键形成a C∶F薄膜 ;XPS结果进一步证明a C∶F膜中存在C—F、CF2 键 ,获得了与FTIR相一致的结果
【Abstract】 With benzene and CHF 3, fluorinated amorphous carbon thin films (a C:F) have been deposited using ECR CVD. The structure of a C∶F has been studied with FTIR and XPS . FTIR measurement shows that F has the main existence of C-F, CF 2 bonds; the chemical states by XPS indicate that the carbon and F are C-F,CF 2 chemically bonded in the films.
- 【文献出处】 功能材料 ,Journal of Functional Materials , 编辑部邮箱 ,2001年05期
- 【分类号】TB43
- 【被引频次】3
- 【下载频次】53