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薄膜厚度测控技术中的物理原理

THE PHYSICS PRINCIPLES ON MEASURING AND CONTROLLING THIN FILM THICKNESS

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【作者】 许世军

【Author】 Xu Shijun (Department of Mathematics and Physics, Xi’an Institute of Technology, Xi’an 710032)

【机构】 西安工业学院数理系!西安710032

【摘要】 针对当前应用较为广泛的各种薄膜厚度测控技术,简明介绍了光电极值法、干 涉法、石英晶体振荡法及椭偏仪法的物理原理及其应用.

【Abstract】 In accordance with many measurement and controlling technologies of thin film thickness which are widespreadly used today, four physics principles and their uses including photoelectic maximum method, interferential method, quartz crystal oscillating method and ellipsometry are introduced simply.

  • 【分类号】O484
  • 【被引频次】19
  • 【下载频次】403
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