【摘要】 以氨气为反应气体 ,用真空阴极电弧沉积法制备了 CNx 膜 ,研究了工艺参数对膜层的沉积速率、化学成分的影响及膜层结合状态 .结果表明 :沉积速率随着氨气分压的提高而下降 ,当氨气分压达到 6 .7Pa时将没有膜的沉积 ;CNx 膜主要由碳和氮组成 ,降低真空系统的抽速、将反应气体导至靶面附近、提高氨气分压可以提高膜层中氮含量 ;氮是以化合态存在于膜层中 .更多还原

【Abstract】 CN x films were fabricated with ammonia as reactive gas by means of vacuum cathodic arc deposition method; the effect of deposition parameters on deposition rates and chemical composition in CN x coatings was studied and chemical bond status of CN x coatings was also analyzed.It was showed that the deposition rate of CN x films decreased with the increase of ammonia partial pressure; the coatings were mainly composed of C and N,and N content in CN x could be increased by decreasing pumping rate of vacuum system, guiding ammonia to the surroundings of the target and increasing ammonia partial pressure; nitrogen existed in the coatings in chemical bond status.更多还原