【摘要】 介绍一种离子束旋转刻蚀工艺,该工艺可用于制作真正意义上连续位相分布的衍射光学元件。对工艺系统中离子束不均匀度和基片与掩模板中心对准误差对器件性能的影响作了模拟计算,并根据对误差的模拟分析提出了工艺改进方案。更多还原

【Abstract】 An ion beam rotation etching technique used for manufacture of diffractive optical elements with continuous relief structure is introduced in the paper. The simulation calculation for the influence of ion beam non-uniformity in the technological system and the alignment error between substrate and mask center on device properties is carried out. The process improvement scheme is proposed according to the simulation analysis for errors.更多还原