【摘要】 采用电感耦合等离子体质谱 (ICP MS)测定高纯镓中痕量杂质元素 ,以Rh作为内标补偿校正镓基体的抑制效应 ,采用异丙醚萃取分离镓与ICP MS技术联用 ,拓展分析方法应用范围 ,可满足99 9999%～ 99.99999%超高纯镓分析方法要求。方法检出限为 0 .0 0 6～ 0 .0 6 2 μg L ;加标回收率为86 8%～ 12 1.4%之间 ;RSD为 1.1%～ 8.6 %更多还原

【Abstract】 A method for the determination of trace impurities in high purity gallium by inductively coupled plasma mass spectrometry (ICP MS) was developed. The interference from the matrix of gallium on ICP MS determination was discussed. Using Rh as internal standard could effectively eliminate signal suppression effect induced by matrix. While using isopropyl ether as extractant the matrix gallium was extracted into organic phase. The detection limits are 0.006～0.082 μg/L; Recoveries of standard addition are 86.8%～121.4%; precision is better than 10%. The method has been applied for the determination of trace impurities in gallium samples with purity of 99.99%～99.99999%.更多还原