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非晶含氟聚合物薄膜的热稳定性
THERMAL STABILITY OF AMORPHOUS FLUOROPOLYMER FILMS
【摘要】 以Teflon AF 1600为原料,用旋涂法制备了非晶含氟聚合物(AF)薄膜.通过扫描电镜(SEM)、傅立叶转换红外(FTIR)光谱和X射线光电子(XPS)光谱等手段对热退火前后的薄膜进行了表征所得薄膜具有无针孔,较光滑和平整的表面,300℃退火后薄膜表面的均匀性进一步改善。AF薄膜在300℃以下具有良好的热稳定性,在400℃退火后CF3吸收峰强度稍有降低。在400C退火后,其所含的CF3键合构型显著降低,CF2、CF等其它构型没有明显的变化,由于CF3基团的分解有少量无定型碳生成.
【Abstract】 Amorphous fluoropolymer films were prepared by using Teflon AF 1600 as raw material and spin-on method. The films were characterized by scan electric mirror (SEM), Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectrum (XPS). SEM photographs showed that the obtained films had no-pinhole and relative smooth and flat surfaces, and the uniformity of the film, improved further after annealing at 300℃. According to FTIR spectra of the films heated at different temperatures, it could be found that AF film had excellent thermal stability below 300℃, and for the film heated at 400℃ the intensity of CF3 adsorption peak decreased slightly. XPS indicated that CF3 bonding configurations in AF film annealed at 400℃ decreased remarkably and CF2, CF etc. bonding configurations didn’t show obvious changes. Meanwhile, a little amorphous carbon may be formed due to decomposition of CF3 groups.
- 【文献出处】 材料研究学报 ,Chinese Journal of Material Research , 编辑部邮箱 ,2001年02期
- 【分类号】TB383
- 【被引频次】3
- 【下载频次】135