【摘要】 利用直流磁控反应溅射法在 Al基底上制备了 Zr N2 及 Ti多层薄膜。利用扫描俄歇微探针的深度剖析和线形分析技术研究了真空热处理对 Ti/ Zr N2 / Al样品膜层之间的界面化学状态和相互作用的影响。研究结果表明 ,真空热处理使 Ti/ Zr N2 / Al薄膜界面上发生了明显的界面扩散和化学反应 ,生成了 Ti Nx 物种 ,并且薄膜内层发生了严重的氧化反应更多还原

【Abstract】 WT5BZ]ZrN 2 and Ti multiplayer was deposited on aluminium using DC magnetron sputtering method The interface diffusion and chemical states on interface were investigated using line shape analysis and depth profile analysis of Auger electron spectroscopy The results show that the interface diffusion of Ti/ZrN 2/Al is intensified by vacuum heat treatment The interface reaction also is promoted by heat treatment and TiN x species are formed on the interface Serious oxidation takes place in the film更多还原