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钽金属的气体渗氮动力学
Kinetics of Gas-nitriding of Tantalum
【摘要】 研究了钽在较低的温度 ( 60 0~ 10 0 0℃ )下、10 5Pa纯氮中渗氮的物相组成和硬化行为。发现表面层由体心立方的N在Ta中的固溶体、六方氮化物Ta2 N和TaN组成 ,但TaN的结构随处理温度不同有所变化。这种变化对渗氮过程有重大影响。渗氮动力学在试验范围内符合抛物线规律 ,但在不同的温度段有不同的活化能值。
【Abstract】 The structures and behavior of nitridation were investigated at 600~1000℃ in pure nitrogen of pressure of 10 5Pa. It was found that the surfaces were composed of tantalum solution,hexagonal Ta 2N and TaN. The structure of TaN changes with the temperature of treatment, which has strong effects on the process of nitridation of tantalum. The kinetics of nitridation of tantalum in this experiment follows parabolic law. But there are different activation energies in different temperatures. [
- 【文献出处】 表面技术 ,Surface Technology , 编辑部邮箱 ,2001年03期
- 【分类号】TG156.82
- 【被引频次】1
- 【下载频次】94