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等离子处理时TiN-MoS_x/Ti涂层中S大量刻蚀的XPS分析
XPS Investigation of Largely Etching of S from the TiN-MoS_x/Ti Composite Coating Under Plasma Treatments
【摘要】 采用 XPS对 Ti N- Mo Sx/Ti复合膜表面 S被 Ar+ 大量刻蚀后化学组成及摩擦学性能的变化机理进行了研究 .长时间离子轰击后复合膜表层的化学计量值 x从最初的 2 .0 3降至 1.2 5 ,Mo3d5/ 2 的结合能从 2 31.73e V相应减小到 2 31.0 7e V.刻蚀 5 min后的涂层表面为深黑色的致密结构 ,摩擦学性能优异 ;而刻蚀 15 min后的涂层表面为浅灰色的疏松结构 ,且摩擦磨损性能也大幅下降
【Abstract】 The changes of chemical components and tribological properties of TiN MoS x /Ti composite coatings caused by largely ion etching S from its surface are studied by XPS. After long time ion etching, the surface Mo/S ratio of the composite coatings decreases from 2 03 to 1 25 with a concomitant reduction in the Mo 3d 5/2 binding energy from 231 73 eV to 231 07 eV. After 5 minutes ion etching, the surface of coatings presents a deep black colored compact structure with excellent tribological properties; but after 15 minutes ion etching, the surface of the coating presents a french grey colored loose structure with greatly decreased tribological properties.
【Key words】 TiN MoS x /Ti composite coating; XPS; ion etching; nano compound unbalanced plasma plating technology;
- 【文献出处】 北京理工大学学报 ,Journal of Beijing Institute of Technology , 编辑部邮箱 ,2001年06期
- 【分类号】TG174.4
- 【被引频次】1
- 【下载频次】127