节点文献
平面工艺辐射探测器的研制
Fabrication of Si Radiation Detector with Plane Technology
【摘要】 使用高阻 Si材料 ,通过氧化、光刻、注入和退火工艺技术研制粒子探测器—— PIN二极管 .采取 HCl氧化、慢降温等工艺措施可减小 PIN二极管的暗电流 (反向电流 ) ,这对于提高器件性能起到了关键作用 .电压为 - 5 V时 ,探测器的暗电流可达 n A/ cm2 量级 .讨论了器件暗电流与少子寿命的关系
【Abstract】 The fabrication of PIN silicon detector has been described in details with some advanced microelectronic technologies,including oxidation,lithography and implantation and annealing.Slowly decrease the temperature after HCl handling,a low dark current (reverse current) can be obtained.At -5V,the performanc of the detector is perfect,and the leakage current is 10nA/cm 2.The relationship between the dark current and the minority carrier lifetime has also been discussed,as well as the measuring method of the minority carrier lifetime.
【关键词】 PIN二极管;
暗电流;
复合中心;
少子寿命;
【Key words】 PIN diode; dark current; recombination center; minority lifetime;
【Key words】 PIN diode; dark current; recombination center; minority lifetime;
- 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,2001年03期
- 【分类号】TN304
- 【被引频次】8
- 【下载频次】88