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重掺碲(100)GaSb单晶的研制

Preparation of Heavily Te-doped GaSb Single Crystal

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【作者】 黎建明屠海令郑安生罗志强

【Author】 Li Jianming,Tu Hailing,Zheng Ansheng and Luo Zhiqiang(General Research Institute for Nonferrous Metals,Beijing 100088,China)

【机构】 北京有色金研究总院!北京100088

【摘要】 采用LEC工艺 ,通过特殊的过滤措施 ,可以批量拉制重掺碲的GaSb单晶材料。计算结果表明 ,在该生长系统及工艺条件下 ,碲在GaSb中的有效分凝系数约为 0 38。GaSb单晶EPD测试表明 :EPD沿径向分布呈“W”型 ,数量约为 1× 1 0 3cm- 2 ;沿晶体生长方向 (1 0 0 )变化不大。

【Abstract】 Based on comparison of the single crystal growth from several Czochralski techniques,it showed that the most advantageous method for GaSb growth seems to be LEC pulling method.Highly Te doped GaSb single crystals can be prepared on small scale with good reproducibility by using special filtering technology.Using the Te concentrations calculated from the Hall measurement,the distribution coefficient of tellurium in GaSb was estimated to be about 0.38 under our growth conditions.The etch pit density (EPD) examination in <100> GaSb showed that the profile of EPD is of W shape in growth plane and the value of average EPD is about 1.0×10 -3 cm -2 along growth direction.

【关键词】 GaSb有效分凝系数EPD
【Key words】 GaSbEffective distribution coefficientEtch pit density
  • 【文献出处】 稀有金属 ,CHINESE JOURNAL OF RARE METALS , 编辑部邮箱 ,2000年05期
  • 【分类号】TG14
  • 【被引频次】1
  • 【下载频次】103
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