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储氢薄膜的吸氢动力学研究
The Kinetics of Hydrogen Interaction With Thin Films
【摘要】 研究了储氢薄膜材料在两相区范围内的吸氢动力学 ,它包括 4个动力学过程 :氢在气 /固表面的化学吸附 ,氢原子的表面渗透 ,氢原子在氢化物层的扩散和金属 /氢化物界面上的氢化物生成。计算结果表明 :当吸氢压强较低时 ,反应主要受化学吸附步骤控制 ;在压强较高 (pH2 peq)和薄膜吸氢的后期 ,表面渗透、扩散和相转变步骤都有可能成为反应速率控制步骤。
【Abstract】 The kinetics of hydrogen adsorption on thin films in the two phase regions are studied. It can be classified as four steps: dissociation of hydrogen molecule and chemisorption on the gas/solid interface, surface penetration of hydrogen atoms, diffussion of hydrogen atoms through the hydride layer as well as hydride formation at the metal/hydride interface. It is shown by theoretical and experimental results that at low pressure, hydriding rate controlling step is mainly chemisorption, and at higher pressure( p H 2 p eq ) and approaching equilibrium of system, one of the other steps becomes rate determining step.
- 【文献出处】 原子能科学技术 ,ATOMIC ENERGY SCIENCE AND TECHNOLOGY , 编辑部邮箱 ,2000年03期
- 【分类号】O484
- 【被引频次】10
- 【下载频次】276