【摘要】 采用同步辐射进行深度X射线光刻是LIGA工艺的关键工序 ,它包括LIGA掩模板的制备、光刻胶的涂制与深度X射线光刻等多个工艺环节 ,该技术在深宽比要求高的微光、微机械及微机电系统的元件制造领域有独特优势[1] 。报道采用LIGA工艺制作微齿轮所涉及上述工艺的研究结果。更多还原

【Abstract】 The X ray lithography with synchrotron radiation is a key step in LIGA Process. It includes many process steps, such as the preparation of LIGA MASK, coating of photoetching resist and deep lithography with X ray. It has original advantages in the field of micromaching for microoptic,micromechanical and MEMS components with the requirement of high aspect ratio. The research results of the mentioned steps related to micromaching of the microgear with LIGA process are reported.更多还原