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离子束刻蚀过程中台阶侧壁倾斜现象研究
study on step sidewall tilt in ion beam etching of Fresnel lens
【摘要】 从标量衍射理论出发 ,在傅立叶光学的基础上 ,建立一个数学模型 ,分析台阶侧壁倾斜对多阶菲涅耳透镜衍射效率的影响。并通过实验 ,分析影响台阶侧壁倾斜、表面粗糙度和刻蚀速率的因素 ,确定离子束刻蚀菲涅耳透镜的最佳工艺参数。
【Abstract】 Based on the theory of scalar diffraction and on the Fourier optics. a mathematical model is established. The effect of step sidewall tilt on diffractive efficiency of Fresnel lens is analyzed. In our experiment, the factor affecting step sidewall tilt, surface roughness and etching speed are analyzed. The optimal technical parameters of ion beam etching of Fresnel lens are confirmed.
【关键词】 离子束刻蚀;
菲涅耳透镜;
台阶侧壁倾斜;
衍射效率;
【Key words】 Ion beam etching; Fresnel lens, step sidewall tilt; diffractive efficiency;
【Key words】 Ion beam etching; Fresnel lens, step sidewall tilt; diffractive efficiency;
- 【文献出处】 微细加工技术 ,MICROFABRICATION TECHNOLOGY , 编辑部邮箱 ,2000年02期
- 【分类号】TN305·7
- 【被引频次】13
- 【下载频次】225