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氮对类金刚石薄膜的微观结构内应力与附着力的影响

EFFECT OF NITROGEN ON THE RESIDUAL STRESS AND ADHESION OF DIAMOND-LIKE AMORPHOUS CARBON NITRIDE FILMS

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【摘要】 采用原子力显微镜 (AFM )、俄歇电子能谱 (AES)和显微压痕分析等手段对射频等离子体增强化学气相沉积法制备的掺氮类金刚石 (DLC :N)薄膜的微观结构和力学性能进行了研究 .结果表明 ,随着含氮量的增加 ,DLC薄膜的AFM表面形貌中出现了几十纳米的颗粒 ,原子侧向力显微镜和AES分析表明这种纳米颗粒是x大于 0 12 6的非晶氮化碳CNx 结构 .这种非晶DLC/CNx 的纳米复合结构 ,减小了薄膜的内应力 ,从而提高了薄膜与衬底的附着力 .

【Abstract】 Microstructure and adhesion properties of nitrogen-doped diamond\|like amorphous carbon (DLC) film deposited by r f plasma\|enhanced chemical vapor deposition method is studied by atomic force microscope, Auger electron spectroscopy (AES) and micro\|indentation analysis. Results show that, with the increase of nitrogen content, particles of tens of nanometer in size appear in the film. The atomic lateral force microscope and AES analyses show that these nano particles are nitrogen\|rich amorphous carbon nitride CN x , where x is larger than 0.126. Micro\|indentation measurement shows that this DLC/CN x nano\|composite structure reduces the residual stress of the film and improves the adhesion between DLC film and Si substrate.

  • 【文献出处】 物理学报 ,ACTA PHYSICA SINICA , 编辑部邮箱 ,2000年11期
  • 【分类号】O484
  • 【被引频次】19
  • 【下载频次】312
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