节点文献
冷等离子体提纯硅粉薄层的实验研究
EXPERIMENTAL RESEARCH ON PURIFICATION OF SILICON POWDER LAYER BY COLD PLASMA
【摘要】 研究了冷等离子体提纯硅粉薄层时硅粉的粒度与硅粉薄层的厚度对提纯效果的影响。实验表明 ,硅粉的颗粒大小在 60— 80μm之间 ,硅薄层的厚度为 0 .5mm时提纯效果较好。
【Abstract】 Cold plasma was developed to purify Si powder layer.The influence of the particle size of Si powder and thickness of Si powder layer on the purity of Si particle was studied.The experiment shows that the optimum particle size of Si is 60~80μm and the optimum thickness of Si powder layer is 0.5mm.
【基金】 国家自然科学基金资助项目
- 【文献出处】 太阳能学报 ,ACTA ENERGIAE SOLARIS SINICA , 编辑部邮箱 ,2000年02期
- 【分类号】TM91
- 【被引频次】7
- 【下载频次】164