【摘要】 采用超声雾化喷涂法沉积得到 Sn O2 薄膜和掺氟离子 Sn O2 薄膜。通过改变掺杂量和选择合适的工艺条件可控制掺氟 Sn O2 薄膜的方块电阻 ,其最小方块电阻值达 10 Ω/□。用 5 5 0 nm单色光测得其透过率为 85 %— 90 %。用 X射线衍射仪及扫描电子显微镜分析 Sn O2 薄膜的微结构和成份 ,薄膜为择优取向晶化。薄膜具有很好的抗腐蚀性能。在已完成 pn结及电极制作工序的单晶硅太阳电池上沉积一层厚 70 nm的未掺杂 Sn O2 薄膜 ,构成光学减反射层 ,其电池的短路电流 Isc提高约 5 %— 10 %。更多还原

【Abstract】 Tin oxide thin films and these thin films doped with fluorine ions are deposited with the spraying method by use of ultrasonic wave atomizer.The sheet resistance of the films can be controlled by changing doping amount of F ions and choosing favorite process conditions,the minimum is 10Ω/□.The transitivity of the SnO 2 films is in the range from 90%to85% measured by the light with wavelength 550nm. X ray diffraction and SEM images analyses demonstrate that the films have a high quality of crystallization with optimized orientation. Un doped SnO 2 thin films with 70nm in thickness are sprayed on c Si solar cell sheets as optical anti reflection coatings,and the short circuit current of solar cells increases by 5%～10%.更多还原